STARKVILLE, Mississippi, October 7, 2003 - The two companies are
combining 4H-silicon carbide (SiC) substrate production capabilities at
II-VI with an advanced SiC epitaxial material growth technology developed
using SiC epitaxy reactors at SemiSouth. The technology is for use in for use
in ultra-high power density electronics, next generation radars,
wireless and satellite communications systems.
The II-VI/SemiSouth team will begin sampling 2-inch
diameter SiC epitaxy wafers with epitaxy structures up to 20 um thick,
with a wide range (5e15 to 1e19 cm-3) of n and p-type doping available to
meet customer needs.
These epitaxial wafers are designed for fabrication of ultra-high power
transistors and rectifiers, which are key building blocks for DC-DC
converters, high-power density and high-frequency power electronics, and
high-frequency radar transmitters.
"We believe that close collaboration with SemiSouth has enabled both
companies to make rapid progress in technology development and will ultimately
lead to a lower cost of manufacturing", says Thomas Anderson, general
manager of the Wide Band Gap Materials Group at II-VI. "We obtain valuable feedback from the
epitaxial material growth and device work provided by SemiSouth to help us
rapidly improve the material quality of our SiC substrates and tailor the
substrate to meet specific requirements of SemiSouth’s epitaxial process."
"The II-VI / SemiSouth team has made significant progress in
developing this new epitaxial wafer technology", remarked Jeff
Casady, president and CTO of SemiSouth. "This joint development
program is helping us develop our merchant epitaxy business, as well
as speed up epitaxy technology development. Because of the
relatively high cost and early stage of both the SiC wafer and epitaxy technologies,
this joint effort will greatly boost both of our products and lead to lower
costs and faster market growth for the SiC electronics industry."
The development of this technology is strongly supported by the U.S.
Government. Since July 2000, SemiSouth and II-VI, Inc. have
received numerous major programs from AFRL, Title III, MDA, Navy EOC
and ONR with a combined total of more than $10 million which have been
focused on technology development, process improvement and process scale-up.
Wide Bandgap Materials Group of II-VI Incorporated has the
strategic goal to become a leading volume supplier of affordable,
high-performance wide bandgap semiconductor materials. This group currently
manufactures and markets single crystal SiC substrates for use in the
solid-state lighting, wireless infrastructure, RF electronics and power
switching industries. The Wide Bandgap Materials Group has two facilities
located in Pine Brook, NJ
and Saxonburg, PA, respectively.